The sputtering yield per cluster ion is higher than that for monomer ion by a factor of more than 100.
离化团束的溅射产额比之单体离子束高100倍以上。
Changes in surface roughness after gas cluster ion bombardments have been measured by an atomic force microscope.
用原子力显微镜测量了气体离化团束照射后表面粗糙度的变化。
The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
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